Apparatus to measure wafer curvature for multilayer systems in a vacuum furnace

A. B. Mann, J. Tapson, D. Van Heerden, A. C. Lewis, D. Josell, T. P. Weihs

Research output: Contribution to journalArticlepeer-review

4 Scopus citations
Original languageAmerican English
Pages (from-to)1821
Number of pages1
JournalReview of Scientific Instruments
Issue number4
StatePublished - Apr 2002
Externally publishedYes

ASJC Scopus subject areas

  • Instrumentation

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