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Ar+ bombardment of 193 nm photoresist: Morphological effects
E. Pargon, D. Nest,
D. B. Graves
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Dive into the research topics of 'Ar+ bombardment of 193 nm photoresist: Morphological effects'. Together they form a unique fingerprint.
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Keyphrases
Photoresist
100%
Morphology Effect
100%
Ar+ Bombardment
100%
Incidence Angle
100%
Striations
66%
Sputtering Yield
66%
Surface Roughening
66%
Steady State
33%
Atomic Force Microscope
33%
Ion Beam
33%
Surface Texture
33%
Plasma Etching
33%
Methacrylate-based
33%
Impact Angle
33%
Sidewall
33%
Microscope Measurement
33%
Yield Decline
33%
High Angles of Incidence
33%
Ion Fluence
33%
Engineering
Photoresist
100%
Angle of Incidence
100%
Bombardment
100%
Sputtering Yield
50%
Atomic Force Microscope
25%
Impact Angle
25%
Side Wall
25%
Material Science
Morphology
100%
Plasma Etching
100%
Surface Texture
100%
Surface (Surface Science)
100%
Physics
Fluence
100%
Steady State
33%
Ion Beam
33%
Plasma Etching
33%