CHEMICAL VAPOR DEPOSITION OF METALS FOR INTEGRATED CIRCUIT APPLICATIONS.

M. L. Green, Roland Levy

Research output: Contribution to journalArticlepeer-review

39 Scopus citations

Abstract

Whereas CVD technology was adopted early by the integrated circuit industry for the deposition of semiconductor and insulator films, CVD metals applications in this industry are only in their infancy. The advantages of CVD metals technology, i. e. , conformal coverage, low temperature and radiation damage-free deposition, selectivity and high purity film formation are discussed in the context of VLSI metallization requirements.

Original languageEnglish (US)
Pages (from-to)63-71
Number of pages9
JournalJournal of Metals
Volume37
Issue number6
DOIs
StatePublished - Jun 1 1985
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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