Effect of interfacial shallow traps on polaron transport at the surface of organic semiconductors

M. F. Calhoun, C. Hsieh, V. Podzorov

Research output: Contribution to journalArticlepeer-review

69 Scopus citations

Abstract

The photo-induced electron and hole transfer across the semiconductor-dielectric interface in trap-dominated p-type organic field-effect transistors has been investigated. It has been observed that the transfer of electrons into the dielectric results in a decrease of the field-effect mobility of polarons, suggesting that additional shallow traps are generated in the conduction channel. Using this effect, the dependence of the field-effect mobility on the density of shallow traps, μ(N), has been measured, which allowed us to estimate the average polaron trapping time, τtr= 50±10ps, and the density of shallow traps, N0=(3±0.5) ×1011cm-2, in the channel of single-crystal tetracene devices.

Original languageAmerican English
Article number096402
JournalPhysical review letters
Volume98
Issue number9
DOIs
StatePublished - Feb 28 2007

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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