Effect of reverse biased voltage at source and drain on plasma damage

Keyphrases

• Reverse-biased 100%
• Floating Potential 100%
• Plasma-induced Damage 100%
• Biased Voltage 100%
• MOSFET 66%
• Antenna 33%
• Gate Oxide 33%
• Charging Damage 33%
• Plasma Processing 33%
• N-channel 33%
• Device Degradation 33%
• Electron Traps 33%
• Charge Plasma 33%
• Gate Injection 33%
• Threshold Voltage Degradation 33%
• Antenna Ratio 33%
• High-field Injection 33%

Engineering

• Antenna 100%
• Metal-Oxide-Semiconductor Field-Effect Transistor 100%
• Plasma Damage 100%
• Gate Oxide 50%
• Plasma Applications 50%