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Ion and vacuum ultraviolet photon beam effects in 193nm photoresist surface roughening: The role of the adamantyl pendant group

  • Ting Ying Chung
  • , David B. Graves
  • , Florian Weilnboeck
  • , Robert L. Bruce
  • , Gottlieb S. Oehrlein
  • , Mingqi Li
  • , Eric A. Hudson

Research output: Contribution to journal › Article › peer-review

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Material Science