Large-area, ordered hexagonal arrays of nanoscale holes or dots from block copolymer templates

Josee Vedrine, Young Rae Hong, Andrew P. Marencic, Richard A. Register, Douglas H. Adamson, Paul M. Chaikin

Research output: Contribution to journalArticle

12 Scopus citations

Abstract

Hexagonal arrays of nanoscale holes or metal dots (25 nm in diameter and 39 nm in period), with orientational order extending over the entire square-centimeter array area, were fabricated on unpatterned silicon wafer substrates using a shear-aligned sphere-forming diblock copolymer template. Since two or more layers of spherical nanodomains are required to achieve alignment in the block copolymer film, but pattern transfer requires a single layer, a multistep etching process was developed, whereby the top layer of a shear-aligned bilayer was evenly removed, leaving the ordered bottom layer as the fabrication template for hole and dot arrays free from grain boundaries.

Original languageEnglish (US)
Article number143110
JournalApplied Physics Letters
Volume91
Issue number14
DOIs
StatePublished - Oct 11 2007

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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