We report, for the first time, the laser direct writing of high-conductivity aluminum interconnects from dimethylaluminum hydride (DMAlH). These lines were deposited from this metalorganic gas using a focused deep-ultraviolet laser beam, and the deposition process was studied as a function of several process parameters. Electrical measurements and Auger electron spectroscopy were used to characterize the quality of the laser-deposited films.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)