TY - GEN
T1 - Molecular dynamics simulation of heat conduction in Si thin films induced by ultrafast laser heating
AU - Zou, Yu
AU - Huai, Xiulan
AU - Xin, Fang
AU - Guo, Zhixiong
PY - 2012
Y1 - 2012
N2 - Molecular dynamics simulations are carried out to study the thermal and mechanical phenomena of ultra-high heat flux conduction induced by ultrafast laser heating in thin Si films. Nanoscale Si films with various depths in heat flux direction are treated as a semi-infinite model for the study of ultrafast heat conduction. A distribution of internal heat source is applied to simulate the absorption of the laser energy in films and the induced temperature distribution. Stress distribution and the evolution of the displacement are calculated. Thermal waves are observed from the development of temperature distribution in the heat flux direction, though the average temperature of the simulated Si films increases monotonically. The average stress shows periodic oscillations. The time development of strain has the same trend as the average stress, and the net heat flux shows the same trend as the stress at different depths of the Si films in the direction of heat flux. This reveals a close relationship between stress and net heat flux in the Si films in the process of ultrafast laser heating.
AB - Molecular dynamics simulations are carried out to study the thermal and mechanical phenomena of ultra-high heat flux conduction induced by ultrafast laser heating in thin Si films. Nanoscale Si films with various depths in heat flux direction are treated as a semi-infinite model for the study of ultrafast heat conduction. A distribution of internal heat source is applied to simulate the absorption of the laser energy in films and the induced temperature distribution. Stress distribution and the evolution of the displacement are calculated. Thermal waves are observed from the development of temperature distribution in the heat flux direction, though the average temperature of the simulated Si films increases monotonically. The average stress shows periodic oscillations. The time development of strain has the same trend as the average stress, and the net heat flux shows the same trend as the stress at different depths of the Si films in the direction of heat flux. This reveals a close relationship between stress and net heat flux in the Si films in the process of ultrafast laser heating.
KW - Heat conduction
KW - Molecular dynamics simulation
KW - Si thin films
KW - Ultrafast laser heating
UR - http://www.scopus.com/inward/record.url?scp=84892638904&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84892638904&partnerID=8YFLogxK
U2 - https://doi.org/10.1115/HT2012-58229
DO - https://doi.org/10.1115/HT2012-58229
M3 - Conference contribution
SN - 9780791844786
T3 - ASME 2012 Heat Transfer Summer Conf. Collocated with the ASME 2012 Fluids Engineering Div. Summer Meeting and the ASME 2012 10th Int. Conf. on Nanochannels, Microchannels and Minichannels, HT 2012
SP - 827
EP - 835
BT - ASME 2012 Heat Transfer Summer Conf. Collocated with the ASME 2012 Fluids Engineering Div. Summer Meeting and the ASME 2012 10th Int. Conf. on Nanochannels, Microchannels and Minichannels, HT 2012
T2 - ASME 2012 Heat Transfer Summer Conference Collocated with the ASME 2012 Fluids Engineering Div. Summer Meeting and the ASME 2012 10th Int. Conf. on Nanochannels, Microchannels and Minichannels, HT 2012
Y2 - 8 July 2012 through 12 July 2012
ER -