Negative Capacitance MgZnO-Channel Thin-Film Transistor with Ferroelectric NiMgZnO in the Gate Stack

Fangzhou Yu, Wen Chiang Hong, Guangyuan Li, Yuxuan Li, Ming Lu, Yicheng Lu

Research output: Contribution to journalArticlepeer-review

Abstract

We demonstrate the negative capacitance thin-film transistor (NC-TFT) on glass substrate using the multifunctional MgZnO (MZO). The Mg0.03Zn0.97O semiconductor layer acts as the TFT channel for stable operation while the Ni-doped MZO, i.e. Ni0.02Mg0.15Zn0.83O (NMZO) serves as the ferroelectric layer in the NMZO/SiO2 stacking gate dielectric structure. The subthreshold swing (SS) value is significantly reduced over the reference TFT without ferroelectric layer. The minimum SS value of the NC-TFT reaches 52 mV/dec while the on/off ratio of drain current {I}_{D} reaches 10{{9}}.

Original languageEnglish (US)
Article number9328548
Pages (from-to)355-358
Number of pages4
JournalIEEE Electron Device Letters
Volume42
Issue number3
DOIs
StatePublished - Mar 2021

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Keywords

  • Negative capacitance
  • magnesium zinc oxide
  • subthreshold swing
  • thin film transistor

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