Properties of all-thin-film glass/ITO/WO3:H/Ta2O5/NiOx/ITO electrochromic devices prepared by magnetron sputtering

Xiaoqi Che; Zhonghou Wu; Guobo Dong; Xungang Diao; Yuliang Zhou; Junji Guo; Dongmei Dong; Mei Wang

doi:10.1016/j.tsf.2018.07.005

Properties of all-thin-film glass/ITO/WO₃:H/Ta₂O₅/NiO_x/ITO electrochromic devices prepared by magnetron sputtering

Xiaoqi Che
, Zhonghou Wu
, Guobo Dong
, Xungang Diao
, Yuliang Zhou
, Junji Guo
, Dongmei Dong
, Mei Wang

Research output: Contribution to journal › Article › peer-review

Abstract

Thin films of WO₃:H (~450 nm) were prepared on indium tin oxide (ITO) coated glass by reactive direct current magnetron sputtering at room temperature. The visible transmittance of the original state, and the X-ray photoelectron spectroscopy analysis of WO₃:H films prove that H⁺ ions have been introduced into the structure of WO₃. Based on the optimized parameters of WO₃:H thin film, the Glass/ITO/WO₃:H/Ta₂O₅/NiO_x/ITO electrochromic devices (ECDs) are prepared monolithically by magnetron sputtering. Different applied voltages of 1.0, 2.0 and 3.0 V were applied to the ECD for investigating its influence on the ECD's optical contrast and cycle life. Though the ECD can get a higher contrast about 42% at 550 nm under 3.0 V voltage, however, it will be destructed quickly. When the operating voltage is 2.0 V, the ECD has a stable cycle performance with the optical contrast of >30%.

Original language	American English
Pages (from-to)	6-12
Number of pages	7
Journal	Thin Solid Films
Volume	662
DOIs	https://doi.org/10.1016/j.tsf.2018.07.005
State	Published - Sep 30 2018
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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@article{c6f9fa8614354bae988a338000500a32,

title = "Properties of all-thin-film glass/ITO/WO3:H/Ta2O5/NiOx/ITO electrochromic devices prepared by magnetron sputtering",

abstract = "Thin films of WO3:H (\textasciitilde{}450 nm) were prepared on indium tin oxide (ITO) coated glass by reactive direct current magnetron sputtering at room temperature. The visible transmittance of the original state, and the X-ray photoelectron spectroscopy analysis of WO3:H films prove that H+ ions have been introduced into the structure of WO3. Based on the optimized parameters of WO3:H thin film, the Glass/ITO/WO3:H/Ta2O5/NiOx/ITO electrochromic devices (ECDs) are prepared monolithically by magnetron sputtering. Different applied voltages of 1.0, 2.0 and 3.0 V were applied to the ECD for investigating its influence on the ECD's optical contrast and cycle life. Though the ECD can get a higher contrast about 42\% at 550 nm under 3.0 V voltage, however, it will be destructed quickly. When the operating voltage is 2.0 V, the ECD has a stable cycle performance with the optical contrast of >30\%.",

author = "Xiaoqi Che and Zhonghou Wu and Guobo Dong and Xungang Diao and Yuliang Zhou and Junji Guo and Dongmei Dong and Mei Wang",

note = "Publisher Copyright: {\textcopyright} 2018",

year = "2018",

month = sep,

day = "30",

doi = "10.1016/j.tsf.2018.07.005",

language = "American English",

volume = "662",

pages = "6--12",

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T1 - Properties of all-thin-film glass/ITO/WO3:H/Ta2O5/NiOx/ITO electrochromic devices prepared by magnetron sputtering

AU - Che, Xiaoqi

AU - Wu, Zhonghou

AU - Dong, Guobo

AU - Diao, Xungang

AU - Zhou, Yuliang

AU - Guo, Junji

AU - Dong, Dongmei

AU - Wang, Mei

PY - 2018/9/30

Y1 - 2018/9/30

N2 - Thin films of WO3:H (~450 nm) were prepared on indium tin oxide (ITO) coated glass by reactive direct current magnetron sputtering at room temperature. The visible transmittance of the original state, and the X-ray photoelectron spectroscopy analysis of WO3:H films prove that H+ ions have been introduced into the structure of WO3. Based on the optimized parameters of WO3:H thin film, the Glass/ITO/WO3:H/Ta2O5/NiOx/ITO electrochromic devices (ECDs) are prepared monolithically by magnetron sputtering. Different applied voltages of 1.0, 2.0 and 3.0 V were applied to the ECD for investigating its influence on the ECD's optical contrast and cycle life. Though the ECD can get a higher contrast about 42% at 550 nm under 3.0 V voltage, however, it will be destructed quickly. When the operating voltage is 2.0 V, the ECD has a stable cycle performance with the optical contrast of >30%.

AB - Thin films of WO3:H (~450 nm) were prepared on indium tin oxide (ITO) coated glass by reactive direct current magnetron sputtering at room temperature. The visible transmittance of the original state, and the X-ray photoelectron spectroscopy analysis of WO3:H films prove that H+ ions have been introduced into the structure of WO3. Based on the optimized parameters of WO3:H thin film, the Glass/ITO/WO3:H/Ta2O5/NiOx/ITO electrochromic devices (ECDs) are prepared monolithically by magnetron sputtering. Different applied voltages of 1.0, 2.0 and 3.0 V were applied to the ECD for investigating its influence on the ECD's optical contrast and cycle life. Though the ECD can get a higher contrast about 42% at 550 nm under 3.0 V voltage, however, it will be destructed quickly. When the operating voltage is 2.0 V, the ECD has a stable cycle performance with the optical contrast of >30%.

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U2 - 10.1016/j.tsf.2018.07.005

DO - 10.1016/j.tsf.2018.07.005

M3 - Article

SN - 0040-6090

VL - 662

SP - 6

EP - 12

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Properties of all-thin-film glass/ITO/WO₃:H/Ta₂O₅/NiO_x/ITO electrochromic devices prepared by magnetron sputtering

Abstract

ASJC Scopus subject areas

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