Reactive-environment hollow cathode sputtering

Compound film production, and application to thin film photovoltaics

Alan E. Delahoy, Sheyu Guo, John Cambridge, Rob Lyndall, J. A.Anna Selvan, Anamika Patel, Andrei Foustotchenko, Baosheng Sang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Citations (Scopus)

Abstract

This paper reviews EPV's development of hardware and process technology to accomplish large area, high rate sputtering from metal targets in a reactive mode without target poisoning. The method is termed reactive-environment hollow cathode sputtering (RE-HCS) and makes use of the intense plasma confined in a hollow cathode. A linearly extended cathode is described, with one or more reactive gases delivered externally to the cathode. The basic operating characteristics of the cathode are described. The method is applied to the development of high performance transparent conducting oxides (TCOs) and other oxides and nitrides. The relevance of RE-HCS to the PV community is further demonstrated through the incorporation of TCOs and other materials produced by the method into thin film PV devices with competitive performance. Versions of the cathode suitable for large width industrial coating have been developed.

Original languageEnglish (US)
Title of host publicationConference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4
Pages327-332
Number of pages6
Volume1
DOIs
StatePublished - Dec 1 2007
Externally publishedYes
Event2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 - Waikoloa, HI, United States
Duration: May 7 2006May 12 2006

Other

Other2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4
CountryUnited States
CityWaikoloa, HI
Period5/7/065/12/06

Fingerprint

Sputtering
Cathodes
Thin films
Oxides
Thin film devices
Nitrides
Gases
Metals
Hardware
Plasmas
Coatings

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Electrical and Electronic Engineering
  • Renewable Energy, Sustainability and the Environment

Cite this

Delahoy, A. E., Guo, S., Cambridge, J., Lyndall, R., Selvan, J. A. A., Patel, A., ... Sang, B. (2007). Reactive-environment hollow cathode sputtering: Compound film production, and application to thin film photovoltaics. In Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 (Vol. 1, pp. 327-332). [4059630] https://doi.org/10.1109/WCPEC.2006.279457
Delahoy, Alan E. ; Guo, Sheyu ; Cambridge, John ; Lyndall, Rob ; Selvan, J. A.Anna ; Patel, Anamika ; Foustotchenko, Andrei ; Sang, Baosheng. / Reactive-environment hollow cathode sputtering : Compound film production, and application to thin film photovoltaics. Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. Vol. 1 2007. pp. 327-332
@inproceedings{c5ad73efccf04475aeb7dccf216935c3,
title = "Reactive-environment hollow cathode sputtering: Compound film production, and application to thin film photovoltaics",
abstract = "This paper reviews EPV's development of hardware and process technology to accomplish large area, high rate sputtering from metal targets in a reactive mode without target poisoning. The method is termed reactive-environment hollow cathode sputtering (RE-HCS) and makes use of the intense plasma confined in a hollow cathode. A linearly extended cathode is described, with one or more reactive gases delivered externally to the cathode. The basic operating characteristics of the cathode are described. The method is applied to the development of high performance transparent conducting oxides (TCOs) and other oxides and nitrides. The relevance of RE-HCS to the PV community is further demonstrated through the incorporation of TCOs and other materials produced by the method into thin film PV devices with competitive performance. Versions of the cathode suitable for large width industrial coating have been developed.",
author = "Delahoy, {Alan E.} and Sheyu Guo and John Cambridge and Rob Lyndall and Selvan, {J. A.Anna} and Anamika Patel and Andrei Foustotchenko and Baosheng Sang",
year = "2007",
month = "12",
day = "1",
doi = "https://doi.org/10.1109/WCPEC.2006.279457",
language = "English (US)",
isbn = "1424400163",
volume = "1",
pages = "327--332",
booktitle = "Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4",

}

Delahoy, AE, Guo, S, Cambridge, J, Lyndall, R, Selvan, JAA, Patel, A, Foustotchenko, A & Sang, B 2007, Reactive-environment hollow cathode sputtering: Compound film production, and application to thin film photovoltaics. in Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. vol. 1, 4059630, pp. 327-332, 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4, Waikoloa, HI, United States, 5/7/06. https://doi.org/10.1109/WCPEC.2006.279457

Reactive-environment hollow cathode sputtering : Compound film production, and application to thin film photovoltaics. / Delahoy, Alan E.; Guo, Sheyu; Cambridge, John; Lyndall, Rob; Selvan, J. A.Anna; Patel, Anamika; Foustotchenko, Andrei; Sang, Baosheng.

Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. Vol. 1 2007. p. 327-332 4059630.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - Reactive-environment hollow cathode sputtering

T2 - Compound film production, and application to thin film photovoltaics

AU - Delahoy, Alan E.

AU - Guo, Sheyu

AU - Cambridge, John

AU - Lyndall, Rob

AU - Selvan, J. A.Anna

AU - Patel, Anamika

AU - Foustotchenko, Andrei

AU - Sang, Baosheng

PY - 2007/12/1

Y1 - 2007/12/1

N2 - This paper reviews EPV's development of hardware and process technology to accomplish large area, high rate sputtering from metal targets in a reactive mode without target poisoning. The method is termed reactive-environment hollow cathode sputtering (RE-HCS) and makes use of the intense plasma confined in a hollow cathode. A linearly extended cathode is described, with one or more reactive gases delivered externally to the cathode. The basic operating characteristics of the cathode are described. The method is applied to the development of high performance transparent conducting oxides (TCOs) and other oxides and nitrides. The relevance of RE-HCS to the PV community is further demonstrated through the incorporation of TCOs and other materials produced by the method into thin film PV devices with competitive performance. Versions of the cathode suitable for large width industrial coating have been developed.

AB - This paper reviews EPV's development of hardware and process technology to accomplish large area, high rate sputtering from metal targets in a reactive mode without target poisoning. The method is termed reactive-environment hollow cathode sputtering (RE-HCS) and makes use of the intense plasma confined in a hollow cathode. A linearly extended cathode is described, with one or more reactive gases delivered externally to the cathode. The basic operating characteristics of the cathode are described. The method is applied to the development of high performance transparent conducting oxides (TCOs) and other oxides and nitrides. The relevance of RE-HCS to the PV community is further demonstrated through the incorporation of TCOs and other materials produced by the method into thin film PV devices with competitive performance. Versions of the cathode suitable for large width industrial coating have been developed.

UR - http://www.scopus.com/inward/record.url?scp=41749105997&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=41749105997&partnerID=8YFLogxK

U2 - https://doi.org/10.1109/WCPEC.2006.279457

DO - https://doi.org/10.1109/WCPEC.2006.279457

M3 - Conference contribution

SN - 1424400163

SN - 9781424400164

VL - 1

SP - 327

EP - 332

BT - Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4

ER -

Delahoy AE, Guo S, Cambridge J, Lyndall R, Selvan JAA, Patel A et al. Reactive-environment hollow cathode sputtering: Compound film production, and application to thin film photovoltaics. In Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. Vol. 1. 2007. p. 327-332. 4059630 https://doi.org/10.1109/WCPEC.2006.279457