Revisiting the charge compensation mechanisms in LiNi0.8Co0.2-: YAlyO2 systems

Zachary W. Lebens-Higgins, Nicholas V. Faenza, Maxwell D. Radin, Hao Liu, Shawn Sallis, Jatinkumar Rana, Julija Vinckeviciute, Philip J. Reeves, Mateusz J. Zuba, Fadwa Badway, Nathalie Pereira, Tien Lin Lee, Tianpin Wu, Clare P. Grey, Brent C. Melot, Anton Van Der Ven, Glenn G. Amatucci, Wanli Yang, Louis F.J. Piper

Research output: Contribution to journalArticlepeer-review

24 Scopus citations

Abstract

Oxygen participation, arising from increased transition metal-oxygen covalency during delithiation, is considered essential for the description of charge compensation in conventional layered oxides. The advent of high-resolution mapping of the O K-edge resonant inelastic X-ray scattering (RIXS) provides an opportunity to revisit the onset and extent of oxygen participation. Combining RIXS with an array of structural and electronic probes for the family of Ni-rich LiNi0.8Co0.2-yAlyO2cathodes, we identify common charge compensation regimes that are assigned to formal transition metal redox (<4.25 V) and oxygen participation through covalency (>4.25 V). From O K-edge RIXS maps, we find the emergence of a sharp RIXS feature in these systems when approaching full delithiation, which has previously been associated with lattice oxidized oxygen in alkali-rich systems. The lack of transition metal redox signatures and strong covalency at these high degrees of delithiation suggest this RIXS feature is similarly attributed to lattice oxygen charge compensation as in the alkali-rich systems. The RIXS feature's evolution with state of charge in conventional layered oxides is evidence that this feature reflects the depopulation of occupied O 2p states associated with oxygen participation.

Original languageEnglish (US)
Pages (from-to)2112-2123
Number of pages12
JournalMaterials Horizons
Volume6
Issue number10
DOIs
StatePublished - Dec 2019

All Science Journal Classification (ASJC) codes

  • Mechanics of Materials
  • Materials Science(all)
  • Electrical and Electronic Engineering
  • Process Chemistry and Technology

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