SCALPEL system

Steven D. Berger, Chris Biddick, M. Blakey, Kevin Bolan, Stephen Bowler, Kevin Brady, Ron Camarda, Wayne Connelly, R. Farrow, Joseph A. Felker, L. A. Fetter, Lloyd R. Harriott, al et al

Research output: Chapter in Book/Report/Conference proceedingConference contribution

12 Citations (Scopus)

Abstract

We have proposed an approach to projection electron beam lithography, termed the SCALPEL system, which we believe offers solutions to previous problems associated with projection electron beam lithography.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsWilliam L. Brodsky, Gilbert V. Shelden
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages434-441
Number of pages8
Volume2322
ISBN (Print)0819416533
StatePublished - Dec 1 1994
Externally publishedYes
Event14th Annual BACUS Symposium on Photomask Technology and Management - Santa Clara, CA, USA
Duration: Sep 14 1994Sep 16 1994

Other

Other14th Annual BACUS Symposium on Photomask Technology and Management
CitySanta Clara, CA, USA
Period9/14/949/16/94

Fingerprint

Electron Beam Lithography
Electron beam lithography
lithography
projection
Projection
electron beams

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Applied Mathematics
  • Electrical and Electronic Engineering
  • Computer Science Applications

Cite this

Berger, S. D., Biddick, C., Blakey, M., Bolan, K., Bowler, S., Brady, K., ... et al, A. (1994). SCALPEL system. In W. L. Brodsky, & G. V. Shelden (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 2322, pp. 434-441). Society of Photo-Optical Instrumentation Engineers.
Berger, Steven D. ; Biddick, Chris ; Blakey, M. ; Bolan, Kevin ; Bowler, Stephen ; Brady, Kevin ; Camarda, Ron ; Connelly, Wayne ; Farrow, R. ; Felker, Joseph A. ; Fetter, L. A. ; Harriott, Lloyd R. ; et al, al. / SCALPEL system. Proceedings of SPIE - The International Society for Optical Engineering. editor / William L. Brodsky ; Gilbert V. Shelden. Vol. 2322 Society of Photo-Optical Instrumentation Engineers, 1994. pp. 434-441
@inproceedings{e7e744c7ef484508bde29babe5c5a131,
title = "SCALPEL system",
abstract = "We have proposed an approach to projection electron beam lithography, termed the SCALPEL system, which we believe offers solutions to previous problems associated with projection electron beam lithography.",
author = "Berger, {Steven D.} and Chris Biddick and M. Blakey and Kevin Bolan and Stephen Bowler and Kevin Brady and Ron Camarda and Wayne Connelly and R. Farrow and Felker, {Joseph A.} and Fetter, {L. A.} and Harriott, {Lloyd R.} and {et al}, al",
year = "1994",
month = "12",
day = "1",
language = "English (US)",
isbn = "0819416533",
volume = "2322",
pages = "434--441",
editor = "Brodsky, {William L.} and Shelden, {Gilbert V.}",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "Society of Photo-Optical Instrumentation Engineers",

}

Berger, SD, Biddick, C, Blakey, M, Bolan, K, Bowler, S, Brady, K, Camarda, R, Connelly, W, Farrow, R, Felker, JA, Fetter, LA, Harriott, LR & et al, A 1994, SCALPEL system. in WL Brodsky & GV Shelden (eds), Proceedings of SPIE - The International Society for Optical Engineering. vol. 2322, Society of Photo-Optical Instrumentation Engineers, pp. 434-441, 14th Annual BACUS Symposium on Photomask Technology and Management, Santa Clara, CA, USA, 9/14/94.

SCALPEL system. / Berger, Steven D.; Biddick, Chris; Blakey, M.; Bolan, Kevin; Bowler, Stephen; Brady, Kevin; Camarda, Ron; Connelly, Wayne; Farrow, R.; Felker, Joseph A.; Fetter, L. A.; Harriott, Lloyd R.; et al, al.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / William L. Brodsky; Gilbert V. Shelden. Vol. 2322 Society of Photo-Optical Instrumentation Engineers, 1994. p. 434-441.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - SCALPEL system

AU - Berger, Steven D.

AU - Biddick, Chris

AU - Blakey, M.

AU - Bolan, Kevin

AU - Bowler, Stephen

AU - Brady, Kevin

AU - Camarda, Ron

AU - Connelly, Wayne

AU - Farrow, R.

AU - Felker, Joseph A.

AU - Fetter, L. A.

AU - Harriott, Lloyd R.

AU - et al, al

PY - 1994/12/1

Y1 - 1994/12/1

N2 - We have proposed an approach to projection electron beam lithography, termed the SCALPEL system, which we believe offers solutions to previous problems associated with projection electron beam lithography.

AB - We have proposed an approach to projection electron beam lithography, termed the SCALPEL system, which we believe offers solutions to previous problems associated with projection electron beam lithography.

UR - http://www.scopus.com/inward/record.url?scp=0028755161&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0028755161&partnerID=8YFLogxK

M3 - Conference contribution

SN - 0819416533

VL - 2322

SP - 434

EP - 441

BT - Proceedings of SPIE - The International Society for Optical Engineering

A2 - Brodsky, William L.

A2 - Shelden, Gilbert V.

PB - Society of Photo-Optical Instrumentation Engineers

ER -

Berger SD, Biddick C, Blakey M, Bolan K, Bowler S, Brady K et al. SCALPEL system. In Brodsky WL, Shelden GV, editors, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 2322. Society of Photo-Optical Instrumentation Engineers. 1994. p. 434-441