Self-formation of polymer nanostructures in plasma etching

Mechanisms and applications

Ke Du, Youhua Jiang, Po Shun Huang, Junjun Ding, Tongchuan Gao, Chang-Hwan Choi

Research output: Contribution to journalReview article

4 Citations (Scopus)

Abstract

In recent years, plasma-induced self-formation of polymer nanostructures has emerged as a simple, scalable and rapid nanomanufacturing technique to pattern sub-100 nm nanostructures. High-aspect-ratio nanostructures (>20:1) are fabricated on a variety of polymer surfaces such as poly(methylmethacrylate) (PMMA), polystyrene (PS), polydimethylsiloxane (PDMS), and fluorinated ethylene propylene (FEP). Sub-100 nm nanostructures (i.e. diameter 50 nm) are fabricated in this one-step process without relying on slow and expensive nanolithography techniques. This review starts with discussion of the self-formation mechanisms including surface modulation, random masks, and materials impurities. Emphasis is put on the applications of polymer nanostructures in the fields of hierarchical nanostructures, liquid repellence, adhesion, lab-on-a-chip, surface enhanced Raman scattering (SERS), organic light emitting diode (OLED), and energy harvesting. The unique advantages of this nanomanufacturing technique are illustrated, followed by prospects.

Original languageEnglish (US)
Article number014006
JournalJournal of Micromechanics and Microengineering
Volume28
Issue number1
DOIs
StatePublished - Jan 1 2018

Fingerprint

Plasma etching
Nanostructures
Polymers
Methylmethacrylate
Nanolithography
Lab-on-a-chip
Energy harvesting
Polystyrenes
Organic light emitting diodes (OLED)
Polydimethylsiloxane
Propylene
Raman scattering
Aspect ratio
Masks
Ethylene
Adhesion
Modulation
Impurities
Plasmas
Liquids

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

Du, Ke ; Jiang, Youhua ; Huang, Po Shun ; Ding, Junjun ; Gao, Tongchuan ; Choi, Chang-Hwan. / Self-formation of polymer nanostructures in plasma etching : Mechanisms and applications. In: Journal of Micromechanics and Microengineering. 2018 ; Vol. 28, No. 1.
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Self-formation of polymer nanostructures in plasma etching : Mechanisms and applications. / Du, Ke; Jiang, Youhua; Huang, Po Shun; Ding, Junjun; Gao, Tongchuan; Choi, Chang-Hwan.

In: Journal of Micromechanics and Microengineering, Vol. 28, No. 1, 014006, 01.01.2018.

Research output: Contribution to journalReview article

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AU - Du, Ke

AU - Jiang, Youhua

AU - Huang, Po Shun

AU - Ding, Junjun

AU - Gao, Tongchuan

AU - Choi, Chang-Hwan

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