Speed investigations toward an industrial application of optical trap assisted nanopatterning

Romain Fardel, Yu Cheng Tsai, Craig B. Arnold

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Optical trap assisted nanopatterning is a viable method of producing parallel nanoscale features over rough surfaces and large areas. The maximum writing speed on various surfaces is elucidated to evaluate the performance of the method.

Original languageAmerican English
Title of host publication2011 Conference on Lasers and Electro-Optics
Subtitle of host publicationLaser Science to Photonic Applications, CLEO 2011
StatePublished - 2011
Event2011 Conference on Lasers and Electro-Optics, CLEO 2011 - Baltimore, MD, United States
Duration: May 1 2011May 6 2011

Publication series

Name2011 Conference on Lasers and Electro-Optics: Laser Science to Photonic Applications, CLEO 2011

Conference

Conference2011 Conference on Lasers and Electro-Optics, CLEO 2011
Country/TerritoryUnited States
CityBaltimore, MD
Period5/1/115/6/11

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics

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