Submicrometer ultrananocrystalline diamond films processed in oxygen and hydrogen plasma and analyzed by UV-vis spectroscopy: Thickness and optical constant results

Research output: Contribution to journalArticlepeer-review

Abstract

Results of UV-vis spectroscopy (spectrophotometry) of highly conductive submicrometer nitrogen-incorporated ultrananocrystalline diamond, (N)UNCD, processed in technologically important oxygen and hydrogen plasmas are presented for the spectral range of 200-1200 nm. The (N)UNCD films feature high contrast interference. As-grown and etched samples were analyzed using a simple practical analytical optics methodology that allowed for accurate evaluation of film thicknesses and (N)UNCD etching rates. The obtained results were cross-validated using scanning electron microscopy. Reflection simulations based on the Fresnel equations and using the optical constants of the Si substrate provided for evaluation of spectral dependencies of the refractive index and extinction coefficient of (N)UNCD. It was found that the presence of grain boundary sp2 phase causes noticeable extinction (zero for diamond) and slightly changes the refractive index, making its behavior nonmonotonic.

Original languageAmerican English
Article number026601
JournalSurface Science Spectra
Volume27
Issue number2
DOIs
StatePublished - Dec 1 2020
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint

Dive into the research topics of 'Submicrometer ultrananocrystalline diamond films processed in oxygen and hydrogen plasma and analyzed by UV-vis spectroscopy: Thickness and optical constant results'. Together they form a unique fingerprint.

Cite this