Skip to main navigation Skip to search Skip to main content

Surface Morphology Evolution of Chemical Vapor-Deposited Tungsten Films on Si(100)

  • Luis Vázquez
  • , Roberto C. Salvarezza
  • , Ezequiel Albano
  • , Alejandro J. Arvia
  • , Alberto Hernández Creus
  • , Roland A. Levy
  • , José M. Albella

Research output: Contribution to journal › Article › peer-review

Original languageEnglish (US)
Pages (from-to)89-91
Number of pages3
JournalChemical Vapor Deposition
Volume4
Issue number3
DOIs
StatePublished - May 1998

ASJC Scopus subject areas

  • General Chemistry
  • Surfaces and Interfaces
  • Process Chemistry and Technology

Cite this