Abstract
Ta films with tetragonal crystalline structure (β-phase), deposited by magnetron sputtering on different substrates (steel, silicon, and silicon dioxide), have been studied. In all cases, very highly preferred (001) orientation was observed in X-ray diffraction measurements. All diffraction data revealed two weak reflections corresponding to d-spacing of 0.5272 and 0.1777 nm. The presence of the two peaks, attributed to (001) and (003) reflections, indicates that β-Ta films exhibit a high preference for the space group of P-421m over P42/mnm, previously proposed for β-Ta. Differences in relative intensities of (00l) reflections, calculated for single crystal β-Ta σ-type Frank-Kasper structure and those measured in the films, are attributed to defects in the films. Molecular dynamics simulations performed on tantalum clusters with six different initial configurations using the embedded-atom-method potential revealed the stability of β-Ta, which might explain its growth on many substrates under various deposition conditions.
Original language | American English |
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Pages (from-to) | 166-173 |
Number of pages | 8 |
Journal | Thin Solid Films |
Volume | 479 |
Issue number | 1-2 |
DOIs | |
State | Published - May 23 2005 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry
Keywords
- Clusters
- Molecular dynamics
- Space group
- X-ray diffraction
- β-tantalum
- σ-type Frank-Kasper structure