Thin films of hard cubic Zr₃N₄ stabilized by stress

TY - JOUR

T1 - Thin films of hard cubic Zr3N4 stabilized by stress

AU - Unalan, H. Emrah

PY - 2005/4

Y1 - 2005/4

N2 - The realization and characterization of hard cubic Zr3N 4 (c-Zr3N4) thin films were discussed. The films, deposited using a novel but industrially viable modified filtered cathodic arc (FCA) method, undergo a phase transformation from orthorhombic to cubic above a critical stress level of 9 GPa as determined by X-ray diffraction and Raman spectroscopy. The c-Zr3N4 films were significantly harder (∼36 GPa) than both the orthorhombic Zr 3N4 and ZrN films (∼27 GPa). It was shown that the ability to deposit this material onto components as a thin film is expected to allow its use in wear- and oxidation-resistant applications.

AB - The realization and characterization of hard cubic Zr3N 4 (c-Zr3N4) thin films were discussed. The films, deposited using a novel but industrially viable modified filtered cathodic arc (FCA) method, undergo a phase transformation from orthorhombic to cubic above a critical stress level of 9 GPa as determined by X-ray diffraction and Raman spectroscopy. The c-Zr3N4 films were significantly harder (∼36 GPa) than both the orthorhombic Zr 3N4 and ZrN films (∼27 GPa). It was shown that the ability to deposit this material onto components as a thin film is expected to allow its use in wear- and oxidation-resistant applications.

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U2 - https://doi.org/10.1038/nmat1338

DO - https://doi.org/10.1038/nmat1338

M3 - Article

C2 - 15765108

VL - 4

SP - 317

EP - 322

JO - Nature Materials

JF - Nature Materials

SN - 1476-1122

IS - 4

ER -